AUTOMATED ELECTRODE REPLACEMENT APPARATUS FOR A PLASMA PROCESSING SYSTEM
摘要
A plasma processing system includes an automated electrode retention mechanism (130) for providing automated engagement of a source electrode (152) with a drive electrode (154). In addition, an automated electrode handling system (320) is provided that has the ability to remove a source electrode (152) from the electrode retention mechanism and replace it with a second source electrode (152') that is stored in a staging area (340) outside the plasma processing system vacuum chamber. The system may operate automatically under program control of a computer system (200) coupled thereto.
申请公布号
WO0209141(A2)
申请公布日期
2002.01.31
申请号
WO2001US22508
申请日期
2001.07.19
申请人
TOKYO ELECTRON LIMITED;SIRKIS, MURRAY, D.;STRANG, ERIC, J.;BIBBY, YU, WANG;CRONIN, JOHN, E.
发明人
SIRKIS, MURRAY, D.;STRANG, ERIC, J.;BIBBY, YU, WANG;CRONIN, JOHN, E.