发明名称 AUTOMATED ELECTRODE REPLACEMENT APPARATUS FOR A PLASMA PROCESSING SYSTEM
摘要 A plasma processing system includes an automated electrode retention mechanism (130) for providing automated engagement of a source electrode (152) with a drive electrode (154). In addition, an automated electrode handling system (320) is provided that has the ability to remove a source electrode (152) from the electrode retention mechanism and replace it with a second source electrode (152') that is stored in a staging area (340) outside the plasma processing system vacuum chamber. The system may operate automatically under program control of a computer system (200) coupled thereto.
申请公布号 WO0209141(A2) 申请公布日期 2002.01.31
申请号 WO2001US22508 申请日期 2001.07.19
申请人 TOKYO ELECTRON LIMITED;SIRKIS, MURRAY, D.;STRANG, ERIC, J.;BIBBY, YU, WANG;CRONIN, JOHN, E. 发明人 SIRKIS, MURRAY, D.;STRANG, ERIC, J.;BIBBY, YU, WANG;CRONIN, JOHN, E.
分类号 H01J37/32 主分类号 H01J37/32
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