SELECTIVE TREATMENT OF THE SURFACE OF A MICROELECTRONIC WORKPIECE

摘要

An apparatus (10) for processing a workpiece (55) in a micro-environment is set forth. The apparatus includes a rotor motor (40) and a workpiece housing (20). The workpiece housing (20) is connected to be rotated by the rotor motor (40). The workpiece housing (20) further defines a substantially closed processing chamber (50) therein in which one or more processing fluids are distributed across at least one face of the workpiece (55) by centripetal accelerations generated during rotation of the housing (20). Various enhancements to the apparatus and processes using the apparatus are also set forth.