发明名称 THINNER COMPOSITION FOR REMOVING PHOTORESIST FOR THIN FILM TRANSISTOR LCD DEVICE
摘要 PURPOSE: A thinner composition is provided, for removing the photoresist for a thin film transistor LCD device, which is aggregated at the edge of a board completely, thereby improving the production yield in TFT-LCD preparation. CONSTITUTION: The thinner composition comprises 1-25 wt% of an alkyl amide of the formula 1; and 75-99 wt% of an organic solvent of the formula 2, wherein R1, R2 and R3 are independent each another and are H or a straight alkyl group of C1-C2, and at least one among them is an alkyl group; and R4, R5 and R6 are independent each another and are a straight alkyl group of C1-C3. Preferably the alkyl amide is selected from the group consisting of N-methyl acetamide, dimethyl formamide, dimethyl acetamide and their mixtures; and the organic solvent is selected from the group consisting of propylene glycol monomethyl ether acetate, β-methoxy isobutyric acid methyl ester, methyl 3-methoxy propionate and their mixtures.
申请公布号 KR20020006831(A) 申请公布日期 2002.01.26
申请号 KR20000040278 申请日期 2000.07.13
申请人 DONG FIN CHEMICAL IND. CO., LTD. 发明人 LEE, SANG DAE;OH, CHANG IL;YOO, JONG SUN;YOON, SEOK IL
分类号 G03F7/42 主分类号 G03F7/42
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