APPARATUS FOR MONITORING VARIATION OF INNER PRESSURE OF DIFFUSION FURNACE TUBE IN SEMICONDUCTOR EQUIPMENT

摘要

PURPOSE: An apparatus for monitoring a variation of an inner pressure of a diffusion furnace tube in semiconductor equipment is provided to prevent a difference of thickness of oxide layers by monitoring a variation of an inner pressure of a diffusion furnace tube. CONSTITUTION: A pressure sensor(10) is installed at a front end of an exhaust line valve. A sensor controller(12) senses a pressure measured by the pressure sensor(10) and the sensed pressure applies to MFC(Mass Flow Control unit)(14). The MFC(14) supplies gas a heater chamber and a load lock chamber and applies the sensed pressure to a gas control board(28) of a tube computer(16). The tube computer(16) includes a CPU board(22), a memory board(24), an interface board(26), a gas control board(28), a boat/loader control board(30), and a thermal control board(32). The tube computer(16) sets up an interlock, controls each board and an alarm sound. A MUX computer(18) controls each control device totally. A display portion(20) displays an internal pressure value of a tube according to a control operation of the MUX computer(18). An alarm portion(21) generates the alarm sound according to the control operation of the MUX computer(18).