| 摘要 |
PURPOSE: A diaphragm for chemical mechanical polisher is provided to reduce lifetime of the diaphragm and to raise maintenance frequency of the CMP machine, therefore increasing throughput. CONSTITUTION: A diaphragm for a chemical mechanical polisher is comprised of a rubber layer and a fiber layer. The size and shape of the diaphragm are suitably designed according to a gap and relative shifting between the rotary unit and holder to prevent creasing of the diaphragm and thereby decrease friction with a sidewall of the rotary unit and holder. |
