发明名称 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To transfer a wafer without damaging it. SOLUTION: In the semiconductor device manufacturing method a wafer 42, mounted and held on a support 28 at the arm top end of a transfer robot 20, is transferred between a cassette 3 for housing a plurality of wafers laminated and mutually separated, and a process jig 30 for housing plurality of wafers laminated and mutually separated. The method comprises a step of detecting the positional of a wafer to be transferred and the positional relation of units around it, using a shape recognizer, a step of controlling the transfer robot 20, based on the detected information to hold the wafer to be transferred on the support, a step of detecting the position for housing the wafer to be transferred and the positional relation of units around it, using a shape recognizer, and a step of controlling the transfer robot to house the wafer to be transferred at a prescribed position.</p>
申请公布号 JP2002026111(A) 申请公布日期 2002.01.25
申请号 JP20000203755 申请日期 2000.07.05
申请人 HITACHI LTD 发明人 WATABE HIROSHI
分类号 B25J13/08;B65G49/07;H01L21/205;H01L21/22;H01L21/68;(IPC1-7):H01L21/68 主分类号 B25J13/08
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