发明名称 RIDGE-WAVEGUIDE SEMICONDUCTOR LASER AND METHOD OF MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide an AlGaInAs-based high-performance, high-reliability, ridge-waveguide semiconductor laser and a method of manufacturing the same. SOLUTION: Since the upper face of a p-AlInAs clad layer 7 is directly covered by a p-InGaAsP etch-stopper layer 8, the p-AlInAs clad layer 7 is not exposed to atmospheric air during processing, therefore no reliability problem due to oxidation of the p-AlInAs clad layer 7 occurs. In addition, since the upper face of the p-AlInAs clad layer 7 is directly covered with the p-InGaAsP etch-stopper layer 8, the etching in forming the ridge can be stopped by the p-InGaAsP etch-stopper layer 8.
申请公布号 JP2002026453(A) 申请公布日期 2002.01.25
申请号 JP20000200836 申请日期 2000.07.03
申请人 MITSUBISHI ELECTRIC CORP 发明人 KADOWAKI TOMOKO;TAKIGUCHI TORU
分类号 H01L21/205;H01S5/22;H01S5/323;(IPC1-7):H01S5/22 主分类号 H01L21/205
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