METHOD OF CREATING DESIGN RULE, DESIGN RULE CREATING SYSTEM, AND RECORDING MEDIUM

摘要

PROBLEM TO BE SOLVED: To provide a method of creating design rules, which enables obtaing easy creation of an optimal design rule, without much time or labor. SOLUTION: This method comprises a process of conducting a compaction of design layout of a semiconductor IC device so as to satisfy specified design rules; a process of predicting the finish shape of a pattern on a wafer, based on the design layout subjected to the compaction process; a process of comparing the estimated finish shape with the design layout subjected to the compaction process; a process of judging whether an evaluation result obtained from the comparison process satisfies a predetermined criterion; a process of altering the design rule, when the evaluation result is judged as being not satisfying the criterion; and a process of defining the altered design rule as a new design rule for the compaction process.