发明名称 MEMORY DEVICE HAVING PEDESTAL COLLAR STRUCTURE FOR CHARGE-HOLDING IMPROVEMENT OF TRENCH-TYPE DRAM CELL AND FORMING METHOD THEREOF
摘要 PROBLEM TO BE SOLVED: To provide a structure and a method for a trench-type capacitor improved in its charge holding capability. SOLUTION: The memory device includes a trench 23 which is formed on a substrate and has an upper part. A collar oxide film 21 is arranged at the upper part of the trench. A collar oxide film includes a pedestal 25. A conductor is charged in the trench. The pedestal reduces a leak of charges in the conductor. The method for forming the memory device, having the collar oxide film having the pedestal collar, is also disclosed.
申请公布号 JP2002026146(A) 申请公布日期 2002.01.25
申请号 JP20010180648 申请日期 2001.06.14
申请人 INTERNATL BUSINESS MACH CORP <IBM> 发明人 DIVAKARUNI RAMA;JAMMY RAJARAO;BYOON WAI KIMU;MANDELMAN JACK A;SUDO AKIRA;TOBBEN DIRK
分类号 H01L21/8242;H01L27/108;H01L29/94 主分类号 H01L21/8242
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