发明名称 FORMING METHOD OF TRANSPARENT CONDUCTIVE FILM
摘要 PROBLEM TO BE SOLVED: To provide a forming method of a transparent conductive film excellent in economy and characteristics which can form a low-resistance transparent conductive film by a coating method. SOLUTION: After a coating film of a transparent conductive material is calcined, it is put through an etching process to be thinned down to a given thickness.
申请公布号 JP2002025361(A) 申请公布日期 2002.01.25
申请号 JP20000208898 申请日期 2000.07.10
申请人 HITACHI CABLE LTD 发明人 UNNO TSUNEHIRO
分类号 H01B13/00;(IPC1-7):H01B13/00 主分类号 H01B13/00
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