发明名称 |
VACUUM ANALYZER, MASS SPECTROMETER AND ELECTRON MICROSCOPIC APPARATUS |
摘要 |
<p>PROBLEM TO BE SOLVED: To suppress nonconformities caused mainly by deposits on the surface of an article in a vacuum analytical system with high efficiency, satisfactory operability, without being subjected to restriction by an article in an apparatus which analyzes charged particles or the energy generated by applying energy to a sample, in a sample chamber which is a part of the analytical system. SOLUTION: A photocatalyst layer is formed on the surfaces of one or more articles in the analytical system, and rays for photodecomposing deposits on the photocatalyst layers are irradiated.</p> |
申请公布号 |
JP2002025497(A) |
申请公布日期 |
2002.01.25 |
申请号 |
JP20000207134 |
申请日期 |
2000.07.07 |
申请人 |
CANON INC |
发明人 |
KOBAYASHI TOYOKO;KOBAYASHI TATSU;KUSAKA TAKAO;TAKADA KAZUHIRO;AEBA TOSHIAKI |
分类号 |
G01N23/04;G01N23/225;G01N23/227;G01N27/62;H01J37/16;H01J37/20;H01J37/26;H01J49/24;(IPC1-7):H01J49/24 |
主分类号 |
G01N23/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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