| 摘要 |
<p>PROBLEM TO BE SOLVED: To correct aberrations of secondary electrons to further improve the detection efficiency of an electron detector, when a charged particle beam imaging system is used to image a sample. SOLUTION: For the charged particle beam method and apparatus, a primary electron beam is used to irradiate a sample, thereby inducing emission of secondary and back scattered electrons respectively, having information as to the form structure and the material structure of the sample. The sample is an article to be inspected. The electrons emitted from the sample are deflected in an electric field of an electron mirror and detected by an electron detector in the apparatus. The electron mirror serves to permit secondary electrons traveling near the optical axis of the device to be detected and corrects the aberration of the secondary electrons. The electron mirror accelerates the electrons to improve the detection efficiency of the electron detector and moreover improves the variation characteristics of the flight time upon collection of the secondary electrons. A second electron mirror may be used for the purpose of further controlling the landing direction of the electrons.</p> |
