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发明名称
Verfahren zur Herstellung einer Hartmaske auf einem Substrat
摘要
申请公布号
DE19958904(C2)
申请公布日期
2002.01.24
申请号
DE19991058904
申请日期
1999.12.07
申请人
INFINEON TECHNOLOGIES AG
发明人
GUTSCHE, MARTIN
分类号
H01L21/027;H01L21/033;H01L21/308;(IPC1-7):H01L21/308;B81C1/00
主分类号
H01L21/027
代理机构
代理人
主权项
地址
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