发明名称 |
HIGH PRECISION ORIENTATION ALIGNMENT AND GAP CONTROL STAGES FOR IMPRINT LITHOGRAPHY PROCESSES |
摘要 |
<p>Processes and associated devices for high precision positioning of a template and substrate during imprint lithography includes a calibration system with a course calibration stage and a fine orientation stage capable of maintaining a uniform gap between the template and substrate. The fine orientation stage includes a pair of flexure members having flexure joints for motion about a pivot point intersected by first and second orientation axes. Actuators lengthen or shorten to expand or contract the flexure members. Separation of the template is achieved using a peel-and-pull method that avoids destruction of imprinted features from the substrate.</p> |
申请公布号 |
WO0133300(A3) |
申请公布日期 |
2002.01.24 |
申请号 |
WO2000US30041 |
申请日期 |
2000.10.30 |
申请人 |
THE BOARD OF REGENTS |
发明人 |
CHOI, BYUNG, JIN;SREENIVASAN, SIDLGATA, V.;JOHNSON, STEPHEN, C. |
分类号 |
G03F7/20;G03F7/00;G03F9/00;H01L21/027;H02N2/00;(IPC1-7):G03F/ |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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