发明名称 MOSFET GATE ELECTRODES HAVING PERFORMANCE TUNED WORK FUNCTIONS AND METHODS OF MAKING SAME
摘要 An insulated gate field effect transistor (FET) of a particular conductivity type, has as a gate electrode, a non-semiconductive material with a work function that approximates the work function of a semiconductive material that is doped to be of the same conductivity type. In a particular embodiment, an integrated circuit includes an n-channel FET having a tantalum-based gate electrode with a work function approximately the same as n-doped polysilicon, and a p-channel FET has a tantalum nitride-based gate electrode with a work function approximately the same as p-doped polysilicon.
申请公布号 US2002008257(A1) 申请公布日期 2002.01.24
申请号 US19980165009 申请日期 1998.09.30
申请人 BARNAK JOHN P.;CHAU ROBERT S.;LIANG CHUNLIN 发明人 BARNAK JOHN P.;CHAU ROBERT S.;LIANG CHUNLIN
分类号 H01L21/8238;H01L29/49;(IPC1-7):H01L29/80;H01L31/112;H01L29/76;H01L29/94;H01L31/062;H01L31/113;H01L31/119 主分类号 H01L21/8238
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