| 摘要 |
<p>A resist composition containing a polymer of t-butyl cinnamate, a photacid generator, and a solvent. Optionally, the resist composition may include a basic compound. The polymer of t-butyl cinnamate has the monomeric units (I) wherein a=0.3 to 0.9, b=0.1 to 0.7, and c=0 to 0.3; R1=H, methyl, or CH¿2?OR?4; R4¿=H or C1-C4 alkyl group; R2=H, methyl, CH¿2?OR?4, CH¿2CN, or CH2X; X=Cl, I, Br, F, or CH2COOR5; R5=C1-C4 alkyl group; and R3= isobornyl, cyclohexyl methyl, cyclohexyl ethyl, benzyl, or phenethyl.</p> |
