Production of structurized surface, stamp profile or hydrophilic and hydrophobic areas by exposure with actinic radiation through mask uses photolyzable compound with hydrophobic unit and specified hydrophilic unit, e.g. trialkylsilyl unit

摘要

In the production of structurized surfaces by irradiation with actinic radiation, using an ultraviolet (UV)-opaque mask and compounds (I) with a hydrophobic unit and hydrophilic unit linked by a photolyzable bond, the hydrophilic unit is a silicon (Si), silver (Ag), indium (In), tin (Sn), carbon (C), sulfur (S) or nitrogen (N) alkyl, alkoxide, hydroxide, oxide or hydride unit. In the production of structurized surfaces by irradiation with actinic radiation, using an ultraviolet (UV)-opaque mask and compounds of formula (I) with a hydrophobic unit and hydrophilic unit linked by a photolyzable bond, the hydrophilic unit is a silicon (Si), silver (Ag), indium (In), tin (Sn), carbon (C), sulfur (S) or nitrogen (N) alkyl, alkoxide, hydroxide, oxide or hydride unit of formula (II): R-X (I) Y(R1>)3 (II) R : a hydrophobic unit; X : a hydrophilic unit of formula (II); Y : Si, Ag, In, Sn, C, S or N; R1>at least one component selected from alkyl, alkoxy, hydroxide, oxide or hydrogen (H). An independent claim is also included for articles with a profiled surface with indentations or hydrophobic and hydrophilic surface areas, produced in this way.