ABSORBING COMPOUNDS FOR SPIN-ON GLASS ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY
摘要
<p>An absorbing ether-like compound including a siliconethoxy, silicondiethoxy, or silicontriethoxy species attached to a naphthalene or anthracene chromophore via an oxygen linkage is used as an organic light-absorbing compound. The absorbing ether-like compound is incorporated into spin-on glass materials to provide anti-reflective coating materials for deep ultraviolet photolithography. A method of synthesizing the light-absorbing ether compounds is based on the reaction of an alcohol-substituted chromophore with an acetoxysilicon compound in the presence of alcohol. A method of making absorbing spin-on-glass materials including the absorbing ether-like compounds is also provided.</p>
申请公布号
WO0206402(A1)
申请公布日期
2002.01.24
申请号
WO2001US22232
申请日期
2001.07.12
申请人
HONEYWELL INTERNATIONAL INC.;BALDWIN, TERESA;RICHEY, MARY;DRAGE, JAMES;WU, HUI-JUNG;SPEAR, RICHARD
发明人
BALDWIN, TERESA;RICHEY, MARY;DRAGE, JAMES;WU, HUI-JUNG;SPEAR, RICHARD