发明名称 |
GRADED MATERIAL AND METHOD FOR SYNTHESIS THEREOF AND METHOD FOR PROCESSING THEREOF |
摘要 |
A graded material wherein the rate of etching by a specific chemical is changed continuously or stepwise from the uppermost surface to an inner part thereof; the above graded material which comprises a main material and an additive capable of changing the rate of etching the material wherein the concentration of the additive is changed continuously or stepwise; the above graded material which comprises, as the main material, a glass material having SiO2 as a primary component, and fluorine as the additive, which is a graded material exhibiting the rate of etching by hydrofluoric acid being changed gradually in the direction of depth. The graded material allows the solution of the problem associated with a conventional, isotropic or anisotropic, homogeneous material, that the etching characteristics of a material depends completely on the property inherent in the material and thus it is frequently difficult or impossible to realize a desired shape. |
申请公布号 |
WO0206560(A1) |
申请公布日期 |
2002.01.24 |
申请号 |
WO2001JP06138 |
申请日期 |
2001.07.16 |
申请人 |
NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE;NIPPON SHEET GLASS CO., LTD.;NISHII, JUNJI;KOYAMA, TADASHI;YAMAGUCHI, JUN |
发明人 |
NISHII, JUNJI;KOYAMA, TADASHI;YAMAGUCHI, JUN |
分类号 |
C03C15/00;C03C17/02;C03C17/245;C23C16/40;C23C16/44;C23C16/56;H01L21/033;H01L21/302;H01L21/3065;H01L21/31;H01L21/311;H01L21/316;(IPC1-7):C23C16/40;H01L21/308 |
主分类号 |
C03C15/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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