Material used for nano-imprint lithography for producing embossed nano-structure in thin film on substrate, useful in optics, optoelectronics and microelectronics, is embossed above glass transition temperature

摘要

Materials used for nano-imprint lithography for producing embossed nano-structures in thin films on substrates consist of polymers with high plasma etching resistance and thermal stability, which are embossed at 60-180, preferably 80-100 deg C above the glass transition temperature of the polymer.