METHOD AND SYSTEM OF AUTOMATIC FLUID DISPENSING FOR IMPRINT LITHOGRAPHY PROCESSES
摘要
Disclosed herein is an automatic fluid dispensing method and system for dispensing fluid on the surface of a plate-like material, or substrate, including a semiconductor wafer for imprint lithography processes. The dispensing method uses fluid dispenser and a substrate stage that may generate relative lateral motions between a fluid dispenser tip a substrate. Also described herein are methods and devices for creating a planar surface on a substrate using a substantially unpatterned planar template.
申请公布号
WO0206902(A2)
申请公布日期
2002.01.24
申请号
WO2001US22536
申请日期
2001.07.17
申请人
BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM
发明人
CHOI, BYUNG, JIN;COLBURN, MATTHEW;SREENIVASAN, S., V.;BAILEY, TODD;WILLSON, C., GRANT;ECKERDT, JOHN