发明名称 Semiconductor device and manufacturing method thereof
摘要 A power MOSFET includes an n--drain layer, a drain contact layer disposed on a first side of the drain layer, a p-type base layer disposed on a second side of the drain layer, and an n-source layer disposed on the base layer. A gate electrode faces, through a gate insulating film, a channel region, which is part of the base layer between the drain and source layers. Source and drain electrodes are electrically connected to the source and drain contact layers, respectively. A plurality of hetero regions having a dielectric constant higher than that of the drain layer is disposed in the drain layer between the source and drain electrodes.
申请公布号 US2002008258(A1) 申请公布日期 2002.01.24
申请号 US20010832208 申请日期 2001.04.11
申请人 BABA YOSHIRO 发明人 BABA YOSHIRO
分类号 H01L21/324;H01L21/336;H01L29/06;H01L29/24;H01L29/40;H01L29/78;(IPC1-7):H01L29/80;H01L31/112;H01L47/00 主分类号 H01L21/324
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