发明名称 |
Optical arrangement and projection exposure system for microlithography with passive thermal compensation |
摘要 |
An optical arrangement with a light source includes an optical element that is fastened in a mount. The light source emits radiation and the optical element is acted on thereby such that the heat that results lacks symmetry corresponding to the shape of the optical element. A connecting structure is provided between the optical element and the mount and has a symmetry that does not correspond to the shape of the optical element and effects an at least partial homogenization of the temperature distribution in the optical element.
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申请公布号 |
US2002008858(A1) |
申请公布日期 |
2002.01.24 |
申请号 |
US20010934817 |
申请日期 |
2001.08.21 |
申请人 |
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发明人 |
WAGNER CHRISTIAN;TRUNZ MICHAEL;HILGERS RALF |
分类号 |
G02B7/02;G03F7/20;(IPC1-7):G03B27/52 |
主分类号 |
G02B7/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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