| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure device which is used for plate making of the working base material in lead frame manufacture by a photoetching process, can rapidly manufacture raw glass, can reduce an equipment cost and material cost in total and can rapidly exchange the raw glass corresponding to products without requiring the storage and management of the raw glass. SOLUTION: The exposure device for reduction stepping of the raw glass to the base material to be exposed is equipped with an illumination section for exposure which illuminates the raw glass and a lens system for reduction stepping of the patterns of the raw glass to the base material to be exposed and the raw glass is a liquid crystal panel displaying the patterns. |
