| 摘要 |
<p>A process for removing deleterious surfaces from polymeric regrind particles in which the polymeric regrind particles such as TPO, PC/ABS, PC/PBT, PA/PP or PA/PPO having a surface material deleterious to post-treatment processes is contacted by an aqueous attritive environment for an interval sufficient to accomplish dissociation of the deleterious surface material from contact with the polymeric regrind particulate substrate and removal of less than 10% of the total mass of polymeric regrind particulate substrate. After sufficient contact between the attritive environment and the polymeric regrind particles, the polymeric regrind particulate substrate is separated from the attritive environment and the retained dissociated deleterious surface material.</p> |
