| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a polishing composition capable of making a high-quality polished surface having no surface defect while keeping high polishing rate, more specifically, to provide a polishing composition capable of making a smooth and excellent polished surface having no surface defect with good polishing efficiency in polishing a substrate surface plated with Ni-P for an aluminum magnetic disk. SOLUTION: This polishing composition is obtained by including at least water, alumina and a solution product of an aluminum salt and, more preferably, is characterized by including in addition, a polishing accelerator in the above components.</p> |
