STYRENE POLYMER CONTAINING ACID DISSOCIABLE ORGANIC GROUP AND RADIATION SENSITIVE RESIN COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a polymer having very small absorption to radiation and useful as a resin component in a radiation sensitive resin composition suitable particularly for a chemical amplification type resist and to provide a radiation sensitive resin composition capable of ensuring rectangularity of a pattern even in a small pattern size, having high sensitivity to various radiations (by which a small amount of exposure energy is needed), giving a pattern free of a change of line width and a T shape due to variation in PED (post exposure time delay) and excellent also in resolution. SOLUTION: The polymer has repeating units of formula (1) (where R1 is a <=20C acid dissociable organic group which is dissociated in the presence of an acid to form an acidic functional group and R2 is H or methyl) as essential units. The radiation sensitive resin composition contains (A) the polymer and (B) a radiation sensitive acid generating agent.