| 摘要 |
PROBLEM TO BE SOLVED: To provide a radiation sensitive composition excellent in resolution, focal depth, dimensional controllability and heat resistance, excellent in dimple resistance particularly in the formation of a hole pattern using a halftone mask and having a wide focus margin. SOLUTION: The radiation sensitive resin composition contains an alkali- insoluble or slightly alkali-soluble resin component (A) which is made alkali- soluble by the action of an acid and a compound (B) which generates the acid under light or electron beams. The component (A) contains at least one polymerization unit of formula [1] or [4] and resins contained in the component (A) contain all of polymerization units [1], [2], [3] and [4] in totality. |
