发明名称 Lithographic apparatus
摘要 <p>A lithographic projection apparatus comprises an active reflector (30) in a radiation system providing a projection beam of radiation and/or in a projection system. The active reflector comprising a body member (33), a reflective multilayer (13) and at least one actuator (31,32) controllable to adjust the surface figure of the reflecting multilayer, wherein the actuator exerts a substantial force component (fr) in a direction parallel to the surface figure of said reflective multilayer. The actuator may be operative to apply torques to said reflector. &lt;IMAGE&gt;</p>
申请公布号 EP1174770(A2) 申请公布日期 2002.01.23
申请号 EP20010305989 申请日期 2001.07.11
申请人 ASML NETHERLANDS B.V. 发明人 VAN DIJSSELDONK, ANTONIUS JOHANNES JOSEPHUS;LOOPSTRA, ERIK ROELOF;FRANKEN, DOMINICUS JACOBUS PETRUS ADRIANUS
分类号 G02B7/185;G02B26/08;G03F7/20;(IPC1-7):G03F7/20;G02B17/08;G02B27/00 主分类号 G02B7/185
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