发明名称 |
Lithographic apparatus |
摘要 |
<p>A lithographic projection apparatus comprises an active reflector (30) in a radiation system providing a projection beam of radiation and/or in a projection system. The active reflector comprising a body member (33), a reflective multilayer (13) and at least one actuator (31,32) controllable to adjust the surface figure of the reflecting multilayer, wherein the actuator exerts a substantial force component (fr) in a direction parallel to the surface figure of said reflective multilayer. The actuator may be operative to apply torques to said reflector. <IMAGE></p> |
申请公布号 |
EP1174770(A2) |
申请公布日期 |
2002.01.23 |
申请号 |
EP20010305989 |
申请日期 |
2001.07.11 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
VAN DIJSSELDONK, ANTONIUS JOHANNES JOSEPHUS;LOOPSTRA, ERIK ROELOF;FRANKEN, DOMINICUS JACOBUS PETRUS ADRIANUS |
分类号 |
G02B7/185;G02B26/08;G03F7/20;(IPC1-7):G03F7/20;G02B17/08;G02B27/00 |
主分类号 |
G02B7/185 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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