摘要 |
PROBLEM TO BE SOLVED: To provide an automatic developing machine for sensitive materials of a wiping system with which always stable processing performance may be obtained and the amount of waste liquid is little. SOLUTION: The automatic developing machine 1 for the sensitive materials which exposes the sensitive materials P and processes the exposed sensitive materials P by wiping the processing liquid thereto is equipped with a transporting means 80 for transporting the sensitive materials P, a processing liquid wiping device 21 for wiping the processing liquid to the sensitive materials under transportation, a processing liquid supplying means 20 for supplying the processing liquid subjected to heating temperature adjustment to this processing liquid wiping device 21, a washing means 40 for washing the processing liquid sticking to the transporting means 80, a washing water heating means 41 for heating washing water and a washing water supplying means 42 for supplying the heated washing water to the washing means 40.
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