发明名称 CLEANING METHOD AND METHOD FOR MANUFACTURING LIQUID CRYSTAL DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a cleaning method by which both of the organic and inorganic contaminants can completely be removed from a work even when the work is cleaned with a hydrocarbone cleaning solution and a surfactant is never left, and to provide a method for manufacturing a liquid crystal device using the cleaning method. SOLUTION: The work is cleaned in first and second precleaning tanks 602 and 603 with a hydrocarbonic cleaning solution containing a surfactant such as fatty acid alkanolamide and the fatty acid salt of N- alkylalkylenediamine in addition to the normal paraffin such as normal nonane and normal decane as the main components in a cleaning machine 500 as a precleaning stage and then dip-cleaned, shower-cleaned or vapor-cleaned in a cleaning tank 601 with the hydrocarbonic cleaning solution free of the surfactant as a post-cleaning stage.
申请公布号 JP2002018374(A) 申请公布日期 2002.01.22
申请号 JP20000205228 申请日期 2000.07.06
申请人 SEIKO EPSON CORP 发明人 ONO YOICHI;HASHIKURA SHINJI
分类号 G02F1/13;B08B3/08;B08B3/10;C11D1/40;C11D1/52;C11D3/18;C11D3/43;C11D7/24;C11D7/50;C11D11/00;C11D17/08;G02F1/1333;(IPC1-7):B08B3/10;G02F1/133 主分类号 G02F1/13
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