发明名称 |
CLEANING METHOD AND METHOD FOR MANUFACTURING LIQUID CRYSTAL DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a cleaning method by which both of the organic and inorganic contaminants can completely be removed from a work even when the work is cleaned with a hydrocarbone cleaning solution and a surfactant is never left, and to provide a method for manufacturing a liquid crystal device using the cleaning method. SOLUTION: The work is cleaned in first and second precleaning tanks 602 and 603 with a hydrocarbonic cleaning solution containing a surfactant such as fatty acid alkanolamide and the fatty acid salt of N- alkylalkylenediamine in addition to the normal paraffin such as normal nonane and normal decane as the main components in a cleaning machine 500 as a precleaning stage and then dip-cleaned, shower-cleaned or vapor-cleaned in a cleaning tank 601 with the hydrocarbonic cleaning solution free of the surfactant as a post-cleaning stage.
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申请公布号 |
JP2002018374(A) |
申请公布日期 |
2002.01.22 |
申请号 |
JP20000205228 |
申请日期 |
2000.07.06 |
申请人 |
SEIKO EPSON CORP |
发明人 |
ONO YOICHI;HASHIKURA SHINJI |
分类号 |
G02F1/13;B08B3/08;B08B3/10;C11D1/40;C11D1/52;C11D3/18;C11D3/43;C11D7/24;C11D7/50;C11D11/00;C11D17/08;G02F1/1333;(IPC1-7):B08B3/10;G02F1/133 |
主分类号 |
G02F1/13 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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