发明名称 |
ELECTROSTATIC ATTRACTION MECHANISM, SURFACE FINISHING METHOD, AND SURFACE FINISHING DEVICE |
摘要 |
<p>PROBLEM TO BE SOLVED: To provide a practical structure capable of suppressing inclusion of charged particles into a plate-like object. SOLUTION: An attraction power supply 3 applies voltages to a pair of attraction electrodes 23 and 24 provided in a dielectric block 22 having an attracting surface to induce static electricity on the attracting surface, thereby electrostatically attracting the plate-like object 9. The attraction power supply 3 adjusts a surface voltage of the plate-like object 9 by independently controlling the applied voltages to respective attraction electrodes 23 and 24. The surface of the plate-like object 9 is treated by this adjustment while suppressing injection of the charged particles into the plate-like object 9. Data obtained by previously measuring surface voltage of the plate-like object 9 while varying voltage applied to each of attraction electrodes 23 and 24 are stored in a storage 62, and a control part 6 for controlling the attraction power supply 3 controls the attraction power supply 3 selected according to this data.</p> |
申请公布号 |
JP2002018661(A) |
申请公布日期 |
2002.01.22 |
申请号 |
JP20000205939 |
申请日期 |
2000.07.06 |
申请人 |
ANELVA CORP |
发明人 |
YAMAGUCHI NOBUO |
分类号 |
B23Q3/15;C23C14/34;C23C16/44;H01L21/00;H01L21/203;H01L21/205;H01L21/302;H01L21/3065;H01L21/683;(IPC1-7):B23Q3/15;H01L21/68;H01L21/306 |
主分类号 |
B23Q3/15 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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