| 发明名称 |
MOCVD precursors based on organometalloid ligands |
| 摘要 |
Volatile metal complexes with alpha-sila-beta-diketonate ligands containing haloalkyl, and particularly, perfluoroalkyl, substitutents are useful as metal precursors for chemical vapor deposition processes and as nanostructured materials containing fluorous domains.
|
| 申请公布号 |
US6340768(B1) |
申请公布日期 |
2002.01.22 |
| 申请号 |
US20000728998 |
申请日期 |
2000.12.04 |
| 申请人 |
RESEARCH FOUNDATION OF STATE UNIVERSITY OF NEW YORK |
发明人 |
WELCH JOHN T.;BANGER KULBINDER KUMAR;HIGASHIYA SEIICHIRO;NGO SILVANA C. |
| 分类号 |
C07F7/08;C07F7/22;C07F7/30;C23C16/18;(IPC1-7):C07F7/02;C07F1/08;C07F1/10;C07F15/06;C23C16/00 |
主分类号 |
C07F7/08 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
