SPIN DRYER HAVING VORTEX PREVENTION APPARATUS

摘要

PURPOSE: A spin dryer having a vortex prevention apparatus is provided to prevent a defective wafer caused by particles or water spots, by effectively reducing vortex generated from a spin dryer process and by preventing air from being induced again to a cradle of the spin dryer. CONSTITUTION: The spin dryer process is performed in a cylindrical process chamber(1). A plurality of semiconductor wafers are installed in the cradle(2) disposed inside the process chamber. A circular rotor fixes the cradle. A plurality of fans(6) are cornerwise disposed along the circumferential surface between the rotor and the process chamber. A guide fixing fan fixes the fans, disposed in the process chamber. An exhaust port is mounted on the side surface of the process chamber.