发明名称 EXHAUSTING APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICE
摘要 PURPOSE: An exhausting apparatus for manufacturing a semiconductor device is provided to prevent a disconnection of a robot signal and a corrosion problem, by installing a ventilation part in a predetermined region inside a process chamber so that gas remaining inside the chamber is easily exhausted to an exhaust duct. CONSTITUTION: The exhaust duct(102) through which unnecessary gas generated in manufacturing the semiconductor device is exhausted to the exterior of the process chamber(100) is installed in the exhausting apparatus. The ventilation part which transfers the necessary gas exhausted form a gas exhaust port to the exhaust duct is installed in the predetermined region inside the process chamber.
申请公布号 KR20020006275(A) 申请公布日期 2002.01.19
申请号 KR20000039847 申请日期 2000.07.12
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 OH, JONG UN;YOO, DONG JUN
分类号 H01L21/30;(IPC1-7):H01L21/30 主分类号 H01L21/30
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