发明名称 |
EXHAUSTING APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICE |
摘要 |
PURPOSE: An exhausting apparatus for manufacturing a semiconductor device is provided to prevent a disconnection of a robot signal and a corrosion problem, by installing a ventilation part in a predetermined region inside a process chamber so that gas remaining inside the chamber is easily exhausted to an exhaust duct. CONSTITUTION: The exhaust duct(102) through which unnecessary gas generated in manufacturing the semiconductor device is exhausted to the exterior of the process chamber(100) is installed in the exhausting apparatus. The ventilation part which transfers the necessary gas exhausted form a gas exhaust port to the exhaust duct is installed in the predetermined region inside the process chamber.
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申请公布号 |
KR20020006275(A) |
申请公布日期 |
2002.01.19 |
申请号 |
KR20000039847 |
申请日期 |
2000.07.12 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
OH, JONG UN;YOO, DONG JUN |
分类号 |
H01L21/30;(IPC1-7):H01L21/30 |
主分类号 |
H01L21/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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