发明名称 Semiconductor device and power amplifier using the same
摘要 A semiconductor device comprising a bipolar transistor having an emitter layer consisting of a semiconductor containing indium, and a protective insulating film containing silicon and oxygen which is formed on the surface of the guard ring of the emitter layer, wherein the protective insulating film has a density of oxygen of less than 7x1022 cm-3. This semiconductor device prevents performance deterioration and ensures high performance in a power amplifier.
申请公布号 US2002005525(A1) 申请公布日期 2002.01.17
申请号 US20010863343 申请日期 2001.05.24
申请人 HITACHI, LTD. 发明人 TAKAZAWA HIROYUKI;OKA TOHRU;OHBU ISAO;IMAMURA YOSHINORI
分类号 H01L29/73;H01L21/316;H01L21/331;H01L29/205;H01L29/737;H03F3/21;H03F3/60;(IPC1-7):H01L29/74;H01L31/111 主分类号 H01L29/73
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