| 发明名称 |
READY-TO-USE STABLE CHEMICAL-MECHANICAL POLISHING SLURRIES |
| 摘要 |
In accordance with the invention, there is provided a chemical-mechanical polishing slurry for polishing a substrate. The slurry is comprised primarily of abrasive particles and an oxidizing agent, wherein the slurry exhibits a stability having a shelf life of at least 30 days. |
| 申请公布号 |
WO0204573(A2) |
申请公布日期 |
2002.01.17 |
| 申请号 |
WO2001US10491 |
申请日期 |
2001.04.02 |
| 申请人 |
ARCH SPECIALTY CHEMICALS, INC. |
发明人 |
PASQUALONI, ANTHONY, MARK;MAHULIKAR, DEEPAK |
| 分类号 |
B24B37/00;C09G1/02;C09K3/14;C09K13/00;H01L21/304 |
主分类号 |
B24B37/00 |
| 代理机构 |
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