A lithograph quality optimization process for controlling laser beam parameters when changing operating modes. The laser is programmed to automatically conduct an optimization procedure preferably in less than one minute to adjust laser operating parameters such as blower speed, total gas pressure and F2 partial pressure in order to optimize beam quality parameters.
申请公布号
WO0205030(A1)
申请公布日期
2002.01.17
申请号
WO2001US05239
申请日期
2001.02.14
申请人
CYMER, INC.;ZAMBON, PAOLO;PADMABANDU, GAMARALALAGE, G.;WATSON, TOM, A.;DAS, PALASH, P.
发明人
ZAMBON, PAOLO;PADMABANDU, GAMARALALAGE, G.;WATSON, TOM, A.;DAS, PALASH, P.