Electrooptic system array, charged-particle beam exposure apparatus using the same, and device manufacturing method

摘要

This invention provides an electrooptic system array having a plurality of electron lenses. This electrooptic system array has at least two electrode structures which respectively include membranes each having a plurality of apertures and are arranged along the optical axis, and a spacer which is interposed between the facing membranes and determines the gap between the facing membranes.