| 摘要 |
<p>The present invention is a support structure for supporting a reticle or silicon wafer (105). The support structure includes a support column (110) and a retaining structure (114). In addition to retaining a wafer, the present invention also creates a discharge path to remove electrostatic charges from the wafer. The retaining structure mechanically engages each support column to create a discharge path from the wafer to a ground.</p> |
