CHARACTERIZATION OF KERNEL FUNCTION IN PHOTOLITHOGRAPHY BASED ON PHOTORESIST PATTERN

摘要

PURPOSE: Provided is a characterization of Kernel function in photolithography based on photoresist pattern to reduce photoresist process, and round and foreshortening. CONSTITUTION: A method for determining the shape and range of Kernel function of a lithography system comprises a step of: exposing a photosensitive layer on the upper surface of a substrate through a mask having a mask image of sufficient width ensuring that a transfer image has a bevel but is not shortened; developing the photosensitive layer to form a transfer image therein; measuring the distance from an intersection at an elongated part projecting from the edge of the transfer image to a point along one edge where a bevel begins; and defining the range of Kernel function as a measurement distance.