| 摘要 |
<p>Provided is a re-circulating particle feed apparatus (10) comprising: a circular conduit (11) suitable for circulating gas suspended particulates; a deposition station (17) comprising an opening onto the conduit into which an electrostatic chuck fits, with a deposition surface of the chuck (9) fits, and a propulsion device (12) for maintaining gas and particle circulation through the conduit (11), wherein the device (12) is adapted to maintain circulation at a rate that brings a deposition effective amount of particles within a range of electro-attractive influence at the deposition station (17).</p> |
