| 摘要 |
PURPOSE: An apparatus and method for producing diffraction grating is provided to simplify its manufacturing process and to improve a yield rate and to increase a possibility of reenact the process. CONSTITUTION: An exposure device(20) comprises a laser source(21), a shutter(25), a first lens(26), a second lens(27), a beam splitter(22) and a reflective mirror(24) so as to design to cast interference patterned lights onto a semiconductor substrate(31). The first lens does a magnification of lights cast from the source at a predetermined angle. The shutter is disposed between the source and the first lens to pass or block the lights. The second lens is employed as a unit for converting the magnified light passed through the first lens into a parallel light. The light running across the second lens is divided by the splitter to be converged onto a target position after each being reflected by the first and second lens, while the light converged on the target may create the difference between the lights. A reactive bath(30) is provide with a holder(32) for mounting the semiconductor substrate to be worked. The holder is provided with a support(33) which is rotatably supported to the incident direction of the interference patterned lights cast from the exposure device. The period of the interference patterns cast into the substrate is controlled by the control between the pivot angle of the holder and the incident angle.
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