Inspection instrument for extreme UV lithographic masks and multi-layer mirrors, includes mirror deflecting primary EUV beam normally onto object

摘要

In the rear focal plane (7) of the electron lens (2), in a plane conjugated with it, or at other locations near the electro-optical axis, an extreme ultra violet (EUV) mirror (6) deflects the incident EUV primary beam (5) onto the object (1) under investigation, to illuminate it normally.