发明名称 PLASMA PROCESSING APPARATUS
摘要 <p>A first conductive plate (31A) constituting the radiation surface of a slot antenna (30A) inclines with respect to a first dielectric member (13) opposed to the radiation surface of the slot antenna (30A). Consequently, a plasma generated by the electric field of an electromagnetic field entering directly from the slot antenna (30A) prevails over a plasma generated by the electric field of a standing wave formed in a processing vessel (11). Since the former can be controlled more easily than the latter, the plasma distribution can be improved.</p>
申请公布号 WO2002005339(P1) 申请公布日期 2002.01.17
申请号 JP2001006004 申请日期 2001.07.11
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