| 摘要 |
PURPOSE: A measured value correcting method for a surface photoreflector is provided to separately measure information generated in a space defined by a reaction chamber, a window surface, and an inner surface of the reaction chamber and correct measured values through a PC to obtain information generated on a sample surface, thereby controlling the thickness of a thin film and the composition ratio. CONSTITUTION: A measured value correcting method for a surface photoreflector includes the steps of radiating a pulse beam passing through a lamp, spectrometer(8) and a chopper(9) to a top surface of a wafer secured on a securing part of a reaction chamber(2) via a first polarizing plate(12) and a first lens(13), comparing values applied from the chopper and a first light detector(14) to applying the value corresponding to an oscillation value of the chopper to a PC(15), and measuring a thickness of a thin film in real time by comparing the measured value through a database program of the PC.
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