| 摘要 |
PURPOSE: A field emission micro-tip and a method for fabricating the same are provided to form easily a tungsten micro-tip by using differences between etching rates and internal stress of a tungsten cathode, a titanium adhesion layer, and an aluminium mask. CONSTITUTION: An adhesion layer(12), a cathode(13), a micro-tip(13'), a mask layer(14), and a cathode support layer(15) are sequentially stacked on a glass substrate(11). The adhesion layer(12) is formed by depositing titanium or aluminium as much as 2000 angstrom. The cathode(13) is formed by depositing tungsten as much as 1 micro meter. The micro-tip(13') is formed by patterning a part of the cathode(13). The mask layer(14) is formed by depositing and patterning titanium or aluminium as much as 1000 angstrom. The cathode support layer(15) is formed by depositing and patterning chrome.
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