Apparatusn for determining exposure conditions, method for determining exposure conditions and process apparatus

摘要

In an apparatus for determining the exposure conditions, a developed pattern is converted into an optical information formed by exposing a plurality of different positions of a substrate at different exposure amounts and focus values to light at a predetermined pattern and developing the pattern thereby to determine the combination of the optimum exposure amount and the optimum focus value from the optical information. To be more specific, the apparatus for determining the exposure conditions includes a light irradiating section for irradiating a predetermined range of the developed pattern formed on the substrate such as a semiconductor wafer with light having a predetermined intensity, a detecting section for measuring the reflected light intensity of the predetermined range irradiated with light having the predetermined intensity, and an arithmetic process section for searching the position where the exposure treatment has been performed with an appropriate exposure amount and an appropriate focus value from the reflected light intensity thereby to determine the exposure conditions.