发明名称 Apparatus and method for coating treatment
摘要 An apparatus for the coating treatment comprises a coating section for coating a substrate with a process solution, a heating section for heating the substrate coated with the process solution, and a recovery section for recovering at least a part of the solvent vapor contained in the hot exhaust gas discharged from the heating section. The recovery section includes a cooling apparatus, and the hot exhaust gas containing a solvent vapor generated from the substrate when the substrate is subjected to a heating treatment is passed through the cooling apparatus so as to cool and condense at least a part of the solvent vapor contained in the hot exhaust gas so as to recover the solvent in the form of a liquid.
申请公布号 US2002006577(A1) 申请公布日期 2002.01.17
申请号 US20010852176 申请日期 2001.05.10
申请人 TOKYO ELECTRON LIMITED 发明人 KIMURA YOSHIO;ISHIDA SEIKI
分类号 G03F7/16;H01L21/00;(IPC1-7):G03F7/004;G03F7/38;B05C11/00 主分类号 G03F7/16
代理机构 代理人
主权项
地址