发明名称 Method of producing a single crystal gallium nitride substrate and single crystal gallium nitride substrate
摘要 GaN single crystal substrates are produced by slicing a GaN single crystal ingot in the planes parallel to the growing direction. Penetration dislocations which have been generated in the growing direction extend mainly in the bulk of the GaN substrate. A few of the threading dislocations appear on the surface of the GaN substrate. GaN substrates of low-dislocation density are obtained. <IMAGE>
申请公布号 EP1172464(A1) 申请公布日期 2002.01.16
申请号 EP20010116827 申请日期 2001.07.10
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD. 发明人 MOTOKI, KENSAKU;KASAI, HITOSHI;OKAHISA, TAKUJI
分类号 C30B29/38;C30B25/02;H01L21/20;H01L21/301;H01L33/32;H01S5/323 主分类号 C30B29/38
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